Study of Annealing Effect on Characteristics of NiFeW Alloy Thin Films

Author
Dr. T. Baskar, Dr. A. Shaji George, Bashiru Aremu, A. S. Hovan George
Keywords
Electroplating; Crystalline Size; Ni-B; X-ray Diffraction; Electrolytic Bath; VHN; VSM; SEM.
Abstract
Alloy thin films of NiFeW were prepared using electroplating at room temperature. Then electroplated NiFeW thin films was annealed at 200 o C. NiFeW deposited films are textured with FCC phase preferred orientation. They were exposed to morphological, structural and mechanical characterization analysis. NiFeW films were bright and uniformly coated on the surface. Also the deposits of NiFeW films were in nano scale and the average crystalline size was around 70 nm. The micro hardness of NiFeW was 142 VHN after annealing.
References
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Received : 21 September2021
Accepted : 20 December 2021
Published : 26 December 2021
DOI: 10.30726/esij/v8.i4.2021.84024

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